Applications industrielles AlN Transmission electron microscopy A Thin films Optical properties PECVD Etching A Chalcogenides Band gap Biomasse CIGSe Alloying Optical interferometry Carbon CHLORINE PLASMAS A Multilayers Nanotubes Thin film Anatase Oxides B2 Semiconducting indium compounds Amorphous Nanocomposite Thin films Biofilms microbiens Physical vapor deposition Chalcogenide CaTiO3Pr^3^+ Kirkendall effect B1 Inorganic compounds Structure Mott insulators Biocapteurs Non-volatile memory X-ray photoelectron spectroscopy Low-pressure plasma processing Sputtering C Photoelectron spectroscopy Optical waveguides B Chemical synthesis BOMBARDMENT Vanadium Sesquioxide Scanning electron microscopy Integrated optics B2 Semiconducting alloys NEXAFS A3 Physical vapor deposition processes Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation X-ray diffraction AZO thin films A1 Characterization CNTs’ collapse Calcined clay Transfert d'énergie Ablation laser B3 Solar cells Aluminium nitride Capacitance Spectroscopic ellipsometry Colloidal solution Rutile Titanium dioxide TiO2 Annealing A-CNx Aryl-diazonium salts Buffer Couple B2 Quaternary Biomembranes AuCu alloy Copper V2O3 Avalanche breakdown Alzheimer's disease Selenization Films Bixbyite CH4 Plasmas froids Atomic force microscopy Resistive switching Ambipolar material Magnetron sputtering Band alignment TEM Atomic layer etching Mass spectrometry Semiconductors Bipolar resistive switching BRS Amyloid precursor Functionalization Adsorption Residual stress Plasma etching Carbon Nanotube SF 6 Mott insulator Sol-gel XPS 3 nm in size